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Gemini

Wafer Etching System by Trion Technology (1 more product)
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Gemini Image

Product Specifications

Product Details

  • Part Number
    Gemini
  • Manufacturer
    Trion Technology

General Parameters

  • Applications
    Plamsa Etching
  • Etching Speed
    Up to 6 µm/min
  • Gases Control
    Up to 7 process gases
  • Process Type
    Dry Etching, Wet Etching
  • Substrates
    GaAs, AlGaAs, GaN, InP, Al
  • Wafer Size
    100 to 300 mm

Technical Documents