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C2R

Thin Film Deposition Equipment by Beneq, Inc (9 more products)
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Product Specifications

Product Details

  • Part Number
    C2R
  • Manufacturer
    Beneq, Inc

General Parameters

  • ALD Processes
    Plasma-Enhanced ALD, Single-side coating
  • Automation
    Brooks MX400 Transfer Module Optional preheating and cooling
  • Batch Capacity
    7 pcs of 200 mm wafer
  • Deposition Rate
    Up to 1.5 µm/hr
  • Integration
    Cluster or Stand-Alone
  • Number Of Plasma Lines
    Up to 3 Lines
  • Overall Dimensions
    3770 x 1284 x 1948 mm
  • Substrate Type
    Wafers, Lenses, Mirrors
  • Temperature Range
    25 to 200 Degree C
  • Transfer Module
    Brooks MX400
  • Type
    ALD Process
  • Uniform Gas
    Up to 3 Gas Lines

Technical Documents
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