Atomic-Premium

Thin Film Deposition Equipment by CN1 Co.,Ltd (1 more product)

Note : Your request will be directed to CN1 Co.,Ltd.

Atomic-Premium Image

Product Specifications

Product Details

  • Part Number
    Atomic-Premium
  • Manufacturer
    CN1 Co.,Ltd

General Parameters

  • ALD Processes
    Thermal ALD Process
  • No of Precursor Canisters
    Up to 4 Sets
  • Process Pressure
    10 Torr
  • Temperature Range
    500 Degree C
  • Type
    ALD Process
  • Wafer Size
    4 to 12 Inches

Technical Documents