Certas LEAGA

Wafer Etching System by Tokyo Electron Limited (4 more products)

Note : Your request will be directed to Tokyo Electron Limited.

Certas LEAGA Image

Product Specifications

Product Details

  • Part Number
    Certas LEAGA
  • Manufacturer
    Tokyo Electron Limited

General Parameters

  • Applications
    Dielectric Etching, Chemical Dry Etching
  • Number Of Chambers
    1 to 6
  • Process Type
    Dry Etching
  • Substrates
    Si
  • Wafer Size
    300 mm

Technical Documents