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UNITY Me+ Ox

Wafer Etching System by Tokyo Electron Limited (4 more products)
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Product Specifications

Product Details

  • Part Number
    UNITY Me+ Ox
  • Manufacturer
    Tokyo Electron Limited

General Parameters

  • Applications
    Plamsa Etching
  • Number Of Chambers
    1 to 4
  • Process Type
    Dry Etching
  • Substrates
    Si, glass, SiC, sapphire, LN, LT, AlTic
  • Wafer Size
    100 mm, 150 mm, 200 mm

Technical Documents