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P1500

Thin Film Deposition Equipment by Beneq, Inc (9 more products)
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Product Specifications

Product Details

  • Part Number
    P1500
  • Manufacturer
    Beneq, Inc

General Parameters

  • ALD Processes
    Thermal ALD
  • Integration
    Stand-Alone
  • Overall Dimensions
    6195 x 2480 x 2600 mm
  • Substrate Space Example
    1300 x 2400 x 750 mm, 300 to 1000 mm
  • Substrate Type
    Glass or Metal Sheets, 3D and freeform parts
  • Temperature Range
    25 to 400 Degree C
  • Type
    ALD Process
  • Usage
    Production
  • Vaccum Chamber Dimensions
    W: 1700 mm

Technical Documents
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