MC-050

Thin Film Deposition Equipment by Annealsys (2 more products)

Note : Your request will be directed to Annealsys.

MC-050 Image

Product Specifications

Product Details

  • Part Number
    MC-050
  • Manufacturer
    Annealsys

General Parameters

  • ALD Processes
    DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD
  • Compressed Air
    6 bar
  • Net Weight
    400 kg
  • Overall Dimensions
    1604 x 955 x 1812 mm
  • Power Supply
    3x400V+N+Gr, 3x220V+Gr, 21 kW
  • Temperature Range
    Up to 1100 Degree C
  • Type
    ALD Process, CVD Process
  • Uniform Gas
    Up to 8 Gas Lines
  • Wafer Size
    Up to 2 Inches
  • Water
    2 to 4 bars, pressure drop 1 bar, 8 l/mn

Technical Documents