Transform Lite

Thin Film Deposition Equipment by Beneq, Inc (9 more products)

Note : Your request will be directed to Beneq, Inc.

Transform Lite Image

Product Specifications

Product Details

  • Part Number
    Transform Lite
  • Manufacturer
    Beneq, Inc

General Parameters

  • ALD Processes
    Al2O3, SiO2, HfO2, Ta2O5, TiO2, TiN, AlN, SiNx, ZnO, ZrO
  • Cooling Option
    Facet-Mounted
  • Integration
    SECS/GEM
  • Maximum Configuration
    2 ALD Modules + Pre-Heater
  • Overall Dimensions
    3060 x 3340 x 2140 mm
  • Temperature Range
    300 Degree C
  • Throughput
    15 wafers/hour (1PM), >25 wafers/hour (2PM’s)
  • Transfer Module
    Brooks Mx400
  • Type
    ALD Process
  • VCE Loadlocks
    1
  • Wafer Size
    3 Inches, 4 Inches, 6 Inches, 8 Inches

Technical Documents